Description
Micron Technology is hiring a Lithography Pathfinding Process Development Engineer in Boise to evaluate and enable next-generation lithography technologies, including 193nm immersion, EUV, and High NA EUV. The role involves developing and optimizing EUV lithography modules, defining mask inspection strategies, collaborating with defect inspection and mask teams, and aligning process transfer, equipment, and materials readiness with manufacturing sites. The engineer will travel up to once per month and requires an M.S. or Ph.D. in a relevant field with at least three years of semiconductor experience, or a B.S. with at least ten years of relevant experience.
