Description
Micron is seeking a Chemical Mechanical Polishing (CMP) Research Scientist to develop and optimize CMP processes, chemistries, and hardware platforms for future semiconductor technology nodes. The role involves fundamental research, process characterization, data analysis, contamination control, surface and interface characterization, and the use of AI-enabled tools to improve research productivity. The scientist will collaborate with engineering and research teams, prepare technical reports, and support continuous improvement of process capability and manufacturing excellence. Candidates must be pursuing an M.S. or Ph.D. in a relevant STEM field with graduation expected after September 2027, and the role prefers semiconductor manufacturing knowledge and CMP experience.
