Description
Micron Technology is hiring a DRAM Dry Etch Process Pathfinding Intern to support the development of advanced plasma etch processes for emerging memory technologies. The intern will conduct experiments and fundamental research, develop and optimize dry etch processes, analyze process performance and capability, communicate technical findings, and use AI and digital tools to accelerate data analysis and process development. The role requires a current Master's or PhD candidate in a relevant technical field with a graduation date after September 2027, along with experience in vacuum systems, RF/plasma science, chemistry, or semiconductor processing equipment.
