Description
Micron is hiring a Principal Engineer / Member of Technical Staff – Dry Etch to lead next-generation plasma etch solutions for NAND scaling and novel device architectures. The role develops and qualifies dry etch processes, evaluates plasma chemistries and hardware, collaborates with cross-functional semiconductor teams, and applies AI-enabled engineering tools and advanced analytics. Candidates need extensive ICP/CCP plasma etch experience, deep knowledge of etch chemistry and profile control, and demonstrated technical leadership; a PhD or MS with 7–10+ years of relevant experience is preferred.
